Scientific Paper on TiO2 Plasma Etching for Photonic Bandgap Structure from Tokyo Institute of Technology Team

November 12, 2015 Samco 2015 Customer, Other Materials Etch, SAMCO Customer Publication, TiO2 Etch

Calculation and fabrication of two-dimensional complete photonic bandgap structures composed of rutile TiO2 single crystals in air/liquid

Sachiko Matsushita1, Akihiro Matsutani2, Yasushi Morii1, Daito Kobayashi1, Kunio Nishioka2, Dai Shoji2, Mina Sato2, Tetsu Tatsuma3, Takumi Sannomiya1, Toshihiro Isobe1, Akira Nakajima1
1 Department of Metallurgy & Ceramics Science, Graduate School of Science & Technology, Tokyo Institute of Technology, 2-12-1-S7-8, Ookayama, Meguro-ku, Tokyo, 152-8552, Japan
2 Technical Department, Semiconductor and MEMS Processing Center, Tokyo Institute of Technology, 4259-R2-3 Nagatsuta, Midori-ku, Yokohama, 226-8503, Japan
3 Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo, 153-8505, Japan
Journal of Materials Science (2016) Volume 51, Issue 2, pp 1066-1073

Titanium Dioxide (TiO2) photonic crystal structure was fabricated using Samco Reactive Ion Etch (RIE) system using fluorine chemistry. Two-dimensional photonic band gaps of the TiO2 structure were theoretically and experimentally studied.

Go to Nakajima & Matushita Lab, Tokyo Institute of Technology

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