Scientific Paper on Chemical Vapor Deposition Processing from Harvard University
Direct-liquid-evaporation chemical vapor deposition of smooth, highly conformal cobalt and cobalt nitride thin films
Jing Yanga, Kecheng Lia, Jun Fengb and Roy G. Gordona,b
a School of Engineering, Applied Sciences, Harvard University, Cambridge, MA 02138, USA
b Department of Chemistry and Chemical Biology, Harvard University, Cambridge, MA 02138, USA
SAMCO UV-Ozone cleaner at Harvard University was used to remove organic contaminants from samples.