Inductively coupled plasma reactive ion etching of GaAs wafer pieces with enhanced device yield
Michael K. Connors, Leo J. Missaggia, William S. Spencer and George W. Turner
Lincoln Laboratory, Massachusetts Institute of Technology, 244 Wood Street, Lexington, Massachusetts 02420
J. Vac. Sci. Technol. B 32, 021207 (2014)
SAMCO ICP Etching System, RIE-200iP was used for process investigation of GaAs plasma etching.
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GaAs Dry Etching Process (ICP-RIE)