• SAMCO Wafer Transfer Robot
  • SAMCO UV-Ozone

Semiconductor Equipment
– PECVD, Plasma Etching & Surface Treatment –
for R&D and Production

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Surface Treatment

Plasma Etching & PECVD Process Solutions

DRIE for MEMS fabrication
Plasma Dicing of Silicon and III-V (GaAs/InP/GaN)
GaN Power Device
SiC trench etching for SiC power device
Photoresist Removal
Low temperature PECVD for SiO2 and SiN plasma deposition
Cathode PECVD
  • SAMCO Engineer

About Samco

Samco Inc. stands as a leading semiconductor equipment company, delivering innovative process systems tailored for both Research and Development (R&D) and production environments. As industry pioneers, we bring forth cutting-edge solutions, leveraging advanced technologies including Atomic Layer Deposition (ALD), Plasma Enhanced Chemical Vapor Deposition (PECVD), Reactive Ion Etch (RIE), Inductively Coupled Plasma (ICP) Etch, Deep Reactive Ion Etch (DRIE), Plasma Cleaning, Aqua Plasma and UV-Ozone Cleaning.

With over four decades of expertise, Samco is a beacon of knowledge, offering unrivaled experience in the development and deployment of highly reliable deposition, etching, cleaning, and surface treatment systems. Our commitment to excellence extends worldwide, serving customers in the electronics industry. At Samco, we take pride in collaborative partnerships, working closely with our clients to surpass even the most challenging process goals.

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