Patterning of light-extraction nanostructures on sapphire substrates using nanoimprint and ICP etching with different masking materials
Hao Chen, Qi Zhang and Stephen Y Chou
Nanostructure Laboratory, Department of Electrical Engineering, Princeton University, Princeton, NJ
08544, USA
Nanotechnology (2015) 26 085302 (8pp)
Samco ICP etching system, RIE-200iP was used for recipe optimization of sapphire nanopatterning to improve light extraction of LEDs.
For our process capabilities on Sapphire plasma etching, please visit the process data page below.
Sapphire Dry Etching Process (ICP-RIE)