Direct fabrication of diffraction grating onto organic single crystals by electron beam lithography
Yoshihiro Kawata, Kazuki Aoki, Yuhi Inada*, Takeshi Yamao, and Shu Hotta
Faculty of Materials Science and Engineering, Kyoto Institute of Technology, Kyoto 606-8585, Japan
Japanese Journal of Applied Physics 57, 03EH11 (2018)
In this paper, direct fabrication of gratings was performed on HMDS-treated SiO2/Si substrates. Samco plasma etching system at Kyoto Institute of Technology was used for plasma etching of SiO2/Si substrates for grating fabrication over an organic semiconducting oligomer 5,5AA-bis(4-biphenylyl)-2,2A:5A,2AA-terthiophene (BP3T). The system was also used for estimate of BP3T etch resistivity.