Scientific Paper on AlN Nanocavity Fabrication Using AlN Plasma Etching from the University of Tokyo

October 27, 2012 Samco 2012 Customer, AlN Etch, Other Materials Etch, Photonic Devices, SAMCO Customer Publication

High-Q AlN photonic crystal nanobeam cavities fabricated by layer transfer

S. Sergent1, M. Arita1, S. Kako1, K. Tanabe1, S. Iwamoto1,2 and Y. Arakawa1,2
1 Institute for Nano Quantum Information Electronics, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
2 Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo 153-8505, Japan
Appl. Phys. Lett. 101, 101106 (2012)

AlN nanopattern was fabricated by AlN plasma etching using Samco ICP etch system to improve the quality factor of nanobeam cavities.

AlN plasma etching

For more information on our ICP etching sytems, please visit the product page below.
Samco ICP Plasma Etcher

Top