Tabletop UV-Ozone Cleaners
The UV-1, UV-2 and UV-300 are compact UV-ozone cleaning systems that can accommodate a variety of substrate shapes and sizes. The systems are easy to operate, and use a unique combination of ultraviolet radiation, ozone and heat to gently, yet effectively, remove organic materials from a variety of substrates including silicon, gallium arsenide, sapphire, metals, ceramics, quartz and glass.
The systems are well suited for a variety of applications such as substrate cleaning, photoresist descumming, improving wettability, surface modification and UV curing. By operating at atmospheric pressure the UV-1, UV-2 and UV-300 eliminate the need for a cumbersome, high-maintenance, vacuum system, and will not damage delicate electronic devices.
Open-load UV-Ozone Cleaners
The UV-300H is a 300 mm UV-Ozone system that includes all the features of the table-top systems. Substrates are loaded into the system through a sliding drawer, and the gap between the stage and ozone manifold is manually adjustable from 1 to 11 mm to allow optimization of a process.
This high-performance unit provides photoresist ashing rates of up to 500 nm/min, and includes numerous safety features to protect the operator and the system. The UV-300H operates at atmospheric pressure and does not require a separate vacuum system.
Atmospheric Cassette UV-Ozone Cleaners
As throughput needs increase, the UV-300HC is a fully automated cassette system that includes a UV-Ozone chamber with a 280 mm stage, Atmospheric Robot, and two cassettes. The cassettes can be configured for single wafer up to 200mm or batch operation using trays. Like the UV-300H the gap between the stage and ozone manifold is manually adjustable from 1 to 11 mm to allow optimization of a process.
Options include a cooling and heating stage to increase throughput.
|Table-top UV-Ozone Cleaners||Open-load UV-Ozone Cleaners||Atmospheric Cassette UV-Ozone Cleaners|
|Loading||Manual Load||Double Cassettes for High Throughput|
|Sample Size||150/200/300 mm||Up to 300 mm||Up to 240 mm|
|Stage Heating||Ambient up to 300°C|
Ozone Generator for Higher Ozone Concentration
Operation at Atmospheric Pressure
Automatic One-button Operation
|Options||UL Certification and CE Mark||Rotating Stage||Heating and Cooling Stages before/after UV-Ozone Treatment|
Gentile surface modification of various materials
Descumming photoresist and E-beam resist
Surface cleaning before packaging
Stage Heating/Ozone Generator
Stage heating and additional ozone by an ozone generator improves etch rate of photoresist.
Rotating stage will enhance etch uniformity over the substrates.
Double cassettes will improve process throughput.
SAMCO UV-Ozone Cleaners are used for device fabrication and sample preparation at state-of-the-art nanofabrication facilities including