UV-Ozone Cleaners (Tabletop or High-volume Processing)

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Tabletop UV-Ozone Cleaners

Bench-top UV/Ozone Cleaners

The UV-1, UV-2 and UV-300 are compact UV-ozone cleaning systems that can accommodate a variety of substrate shapes and sizes. The systems are easy to operate, and use a unique combination of ultraviolet radiation, ozone and heat to gently, yet effectively, remove organic materials from a variety of substrates including silicon, gallium arsenide, sapphire, metals, ceramics, quartz and glass.

The systems are well suited for a variety of applications such as substrate cleaning, photoresist descumming, improving wettability, surface modification and UV curing. By operating at atmospheric pressure the UV-1, UV-2 and UV-300 eliminate the need for a cumbersome, high-maintenance, vacuum system, and will not damage delicate electronic devices.

Open-load UV-Ozone Cleaners

Openload UV/Ozone Cleaners

The UV-300H is a 300 mm UV-Ozone system that includes all the features of the table-top systems. Substrates are loaded into the system through a sliding drawer, and the gap between the stage and ozone manifold is manually adjustable from 1 to 11 mm to allow optimization of a process.

This high-performance unit provides photoresist ashing rates of up to 500 nm/min, and includes numerous safety features to protect the operator and the system. The UV-300H operates at atmospheric pressure and does not require a separate vacuum system.

Atmospheric Cassette UV-Ozone Cleaners

Atmospheric Cassette UV-Ozone Cleaners

As throughput needs increase, the UV-300HC is a fully automated cassette system that includes a UV-Ozone chamber with a 280 mm stage, Atmospheric Robot, and two cassettes. The cassettes can be configured for single wafer up to 200mm or batch operation using trays. Like the UV-300H the gap between the stage and ozone manifold is manually adjustable from 1 to 11 mm to allow optimization of a process.

Options include a cooling and heating stage to increase throughput.

Table-top UV-Ozone Cleaners Open-load UV-Ozone Cleaners Atmospheric Cassette UV-Ozone Cleaners
Loading Manual Load Double Cassettes for High Throughput
Sample Size 150/200/300 mm Up to 300 mm Up to 240 mm
Stage Heating Ambient up to 300°C
System Features

Ozone Generator for Higher Ozone Concentration

Operation at Atmospheric Pressure

Ozone Scrubber

Automatic One-button Operation

Options UL Certification and CE Mark Rotating Stage Heating and Cooling Stages before/after UV-Ozone Treatment
Applications

Photoresist ashing

Gentile surface modification of various materials
– No physical damage and charging on substrates compared to plasma treatment

Descumming photoresist and E-beam resist

Surface cleaning before packaging

Ink removal

Failure Analysis

System Features

 Stage Heating/Ozone Generator

UV/Ozone Photoresist Ashing 1

Stage heating and additional ozone by an ozone generator improves etch rate of photoresist.

 Rotating Stage

Rotating State

Rotating stage will enhance etch uniformity over the substrates.

Double Cassettes

Fully-automated cassette-to-cassette wafer loading

Double cassettes will improve process throughput.

  • SAMCO UV/Ozone Cleaners

Testimonial

 SAMCO UV-Ozone Cleaners are used for device fabrication and sample preparation at state-of-the-art nanofabrication facilities including

Contact SAMCO for more product information
Any questions? Contact us for more detail.
Contact SAMCO for more product information
Any questions? Contact us for more detail.
Contact SAMCO for more product information
Any questions? Contact us for more detail.
Contact SAMCO for more product information
Contact us for more detail.
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