RF Devices | SAMCO Inc.

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GaN Epitaxial Growth by MOCVD System | RF Device Manufacturing Process

Trench Etching by ICP Etching System | RF Device Manufacturing Process

GaN Epitaxial Growth by MOCVD System | RF Device Manufacturing Process

Compound Semiconductor Wafer | RF Device Manufacturing Process

Mask Formation by Plasma CVD system| RF Device Manufacturing Process

Mask Etching by ICP Etching System | RF Device Manufacturing Process

Ion Implanting | RF Device Manufacturing Process

Mask Removal | RF Device Manufacturing Process

Recess Formation by ICP Etching system | RF Device Manufacturing Process

Electrode Formation | RF Device Manufacturing Process

Protection Film Deposition by Plasma CVD system | RF Device Manufacturing Process

Contact Hole Etching by ICP Etching System | RF Device Manufacturing Process

Glue Wafer on Support | RF Device Manufacturing Process

Via Hole Formation by ICP etching system | RF Device Manufacturing Process

Electrode Formation | RF Device Manufacturing Process

Plasma Cleaning before Packaging | RF Device Manufacturing Process

Plasma Cleaning before Wire Bonding | RF Device Manufacturing Process

Encapsulating | RF Device Manufacturing Process

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