Cleaning Systems

UV-1

Bench top UV-Ozone Cleaning System
SAMCO's UV-1 is a compact, bench top, UV-Ozone Cleaner that will not damage delicate electronic devices. This easy to operate system uses a unique combination of ultraviolet radiation, ozone and heat to gently, yet effectively, remove organic materials from a variety of substrates including silicon, gallium arsenide (GaAs), Sapphire, metals, ceramics, quartz and glass.
The versatile UV-1 is well-suited for a variety of applications such as substrate cleaning, photoresist descumming, improving wettability, and UV curing. By operating at atmospheric pressure, the SAMCO UV-1 eliminates the need for a cumbersome, high maintenance vacuum system.

Dimensions:

Main Unit: 450(W) x 400(D) x 440(H) mm


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  • Features
  • Applications
  • Accommodates a variety of sample and wafer sizes up to 6" in diameter

  • Compact, uses minimum bench top space

  • User friendly operation

  • Temperature control (Ambient to 300°C)

  • Completely dry process and will not cause any electrical damage to circuits

  • Operates at atmospheric pressure

  • Door interlock system

  • Includes an ozone catalyst ("ozone killer") unit

  • Removing organic contamination

  • Pre-clean wafers prior to deposition/coating

  • Descumming photoresist and polyimide

  • Modifying surfaces for better adhesion

  • Improving lube coverage on magnetic disks

  • UV curing

  • Growth of thin stable oxide films on silicon and gallium arsenide (GaAs)

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