UV-1

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Bench top UV-Ozone Cleaning System
SAMCO's UV-1 is a compact, bench top, UV-Ozone Cleaner that will not damage delicate electronic devices. This easy to operate system uses a unique combination of ultraviolet radiation, ozone and heat to gently, yet effectively, remove organic materials from a variety of substrates including silicon, gallium arsenide (GaAs), Sapphire, metals, ceramics, quartz and glass.
The versatile UV-1 is well-suited for a variety of applications such as substrate cleaning, photoresist descumming, improving wettability, and UV curing. By operating at atmospheric pressure, the SAMCO UV-1 eliminates the need for a cumbersome, high maintenance vacuum system.

Dimensions:

Main Unit: 450(W) x 400(D) x 440(H) mm

Accommodates a variety of sample and wafer sizes up to 6" in diameter
Compact, uses minimum bench top space
User friendly operation
Temperature control (Ambient to 300°C)
Completely dry process and will not cause any electrical damage to circuits
Operates at atmospheric pressure
Door interlock system
Includes an ozone catalyst ("ozone killer") unit

Removing organic contamination
Pre-clean wafers prior to deposition/coating
Descumming photoresist and polyimide
Modifying surfaces for better adhesion
Improving lube coverage on magnetic disks
UV curing
Growth of thin stable oxide films on silicon and gallium arsenide (GaAs)