SAMCO, Inc. is a process equipment company that develops and manufactures a wide variety of unique deposition, etching, and surface treatment systems for a worldwide network of major industrial customers and academic facilities. We provide process expertise and turnkey systems to major manufacturers in the compound semiconductor, optoelectronics, MEMS and other industries.

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December 2007
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“Samco and Tsinghua University thin film technical seminar” in Beijing where technical papers were presented and discussed in detail... [more]

- SAMCO held a ceremony for the construction its second Research and Development Center ... [more]

- SAMCO has announced the release of a new high-density ICP etching system, which is specifically designed for nano-scale etching of compound semiconductor materials. [more]

November 2007
- SAMCO received an order for an RIE-101iPH system from National Cheng Kung University in Taiwan for their MEMS applications.

- A leading LED manufacturer in Taiwan purchased 5 SAMCO systems (three SAMCO RIE-230iPC and two PD-4800 systems.

- SAMCO received an order for a RIE-200iPC system from an LED company in Taiwan for high-volume manufacturing.

October 2007
- National Tsing Hua University in Taiwan placed an order for a SAMCO PC-300 (Plasma Cleaner) system.

- A leading LED manufacturing company in Taiwan placed an order for a SAMCO RIE-200iPC system for high volume manufacturing of LEDs.

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High-Rate BOSCH Etching System

The SAMCO RIE-800iPB is specifically designed for the BOSCH process to achieve superior performance for high-speed deep vertical etching of silicon for MEMS applications.... Details

Compound Semiconductor ICP Etching System

SAMCO's RIE-140iP is a single wafer ICP etching system especially designed for compound semiconductor materials. This system features SAMCO's latest ICP plasma source technology which generates stable high-density plasma.... Details

Plasma-Enhanced CVD System

The SAMCO PD-220NA is a unique PECVD system designed for the deposition of silicon-based thin films (SiO2, Si3N4, SiOxNy, a-Si:H)...  Details

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