Diamond Dry Etching Process (RIE or ICP-RIE)

 SAMCO Inc. > Tech Resources > Diamond Etching

Material Properties and Applications of Diamond

Diamond is a carbon-based material with a crystal lattice structure. This material is known for the highest hardness in natural bulk materials, and is used for industrial cutting tools. Recently many researchers are getting interested in device research using this material due to its unique material properties.

• Hardness : 10 (Mohs scale)
• Bandgap : 5.45 eV
• Breakdown Field : 10 MV/cm
• Electron Mobility : 1800 cm2/V・s
• Thermal Conductivity : 22 W/(cm·K) (13.5 times that of Silicon)

Periodic Table (Diamond)

One of the promising device applications of diamond is the diamond-based power transistor. Currently, Gallium Nitride (GaN) and Silicon Carbide (SiC) power electronics are actively being developed to replace conventional silicon-based power devices with high breakdown voltage, high speed switching and low on-resistance. Diamond can be another candidate material for power electronics due to its high thermal conductivity.

Another application is the diamond photodetector. The diamond photodetector has several advantages including low noise and high sensitivity over conventional silicon-based devices. Also, diamond-based quantum device is another interesting application. In terms of device fabrication for sensors and electronics, Chemical Vapor Deposition (CVD) technologies are used for epitaxial growth. Although the manufacturing cost of a diamond substrate is still a huge challenge, the material can see “brilliant” future in next-generation electronics.

Diamond Dry Etching

Diamond hexagonal pattern was fabricated using an ICP etch system.
Ni shadow mask was used for this process, and etch depth was 13 µm.

Diamond Plasma Etching

Top View

Diamond Dry Etching

Top View

Diamond Patterning

Tilted View

System Lineup for Diamond Dry Etching

RIE Systems

– Versatile for various etching tests

RIE Systems for Diamond Plasma Etching


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ICP Etch Systems

– Multiple ICP coil options to optimize process recipes

ICP Etch Systems for Diamond Dry Etching


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  • Diamond Plasma Etching


 Samco offers RIE systems and ICP etch systems for diamond plasma etching.
There are several customers working on diamond device research using our process equipment for diamond plasma etching including

National Institute for Materials Science (NIMS)

Please check papers on diamond device fabrication by Samco customers.

Any Questions?

Contact SAMCO for more product information