Superconductive ICT Device Lab (NICT): Shigehito Miki, Ph.D.
Discover how superconducting nanostrip single-photon detectors are advancing quantum communication, computing, LiDAR, and deep-space research.
Events
Date
September 17, 2026
–
September 19, 2026
Location
Yashobhoomi, New Delhi, India
Date
October 13, 2026
–
October 15, 2026
Location
Moscone Center, San Francisco, CA
Latest News
A 70% Reduction in Takt Time: Intro to Plasma CVD System PD-2201HLC
New PD-2201HLC plasma CVD system cuts takt time by 70% while maintaining high deposition rates, film uniformity, and repeatability.
Samco’s 5,000th System to Support Open-Access Semiconductor Research at Tohoku University
Samco’s 5,000th system, an RIE-200NL etcher, will support open-access semiconductor and MEMS research and training at Tohoku University.
Samco Donates to the 2026 Venezuela Earthquake Relief Fund
Samco donated 10 million yen (approximately 60,000 USD) to the Japanese Red Cross Society’s 2026 Venezuela Earthquake Relief Fund to support relief and recovery efforts.
Samco to Join UGIM 2026 at Stanford University
Samco Inc. will attend UGIM 2026 at Stanford University from July 19–22. Visit Samco at Table #1 to discuss plasma etching, ALE, PECVD, and surface treatment solutions for micro/nanofabrication facilities.
Red Cross Blood Drive Held at Samco HQ
Eighteen Samco employees participated in a blood donation drive at our Kyoto headquarters, helping maintain a stable blood supply for patients in need.
Samco Presents SiO₂ ALE Etch Stabilization Research at ALD/ALE 2026
Samco Inc. will present a poster on SiO₂ quasi-ALE etch rate stability using O₂ plasma at ALD/ALE 2026 in Tampa, Florida.
Matthew – Supporting customers across the U.S.
Meet Matthew Alexander, Program Manager at Samco’s U.S. branch, and learn about his career journey, team culture, and work supporting semiconductor R&D.
DTU Nanolab Expands Silicon DRIE Infrastructure with Etch System
DTU Nanolab, Denmark’s national nanofabrication facility, will expand its silicon DRIE infrastructure with Samco’s cassette-loading RIE-800iPBC system to support advanced MEMS, photonics, and microfabrication research.
Tohoku University: Professor Mikihiko Oogane
Professor Mikihiko Oogane discusses TMR sensors, quantum spintronics, and brain–information interfaces in magnetic sensing research at Tohoku University.
Introduction to the Dual-Chamber ALD System AD-8002LPC
Samco’s AD-8002LPC dual-chamber ALD system enables stable TiOx deposition, reduced takt time, and flexible thermal and plasma ALD processing.
University of Central Arkansas Students Visit Samco Production Facility
UCA students visit Samco to learn about semiconductors, plasma processing, Japanese business, and Samco’s founding story.
Samco Presents ALE Technologies at OneNano Mid-Atlantic Meeting
Samco presented ALE technologies at OneNano’s Spring Meredith Meeting, highlighting plasma-assisted etching for GaN HEMTs, diamond, and nanoscale devices.
Samco to Exhibit at CS MANTECH 2026 in Portland
Samco Inc. will exhibit at CS MANTECH 2026, taking place from May 18–21, 2026, at the Portland Marriott Downtown Waterfront in Portland, Oregon.
Visiting Samco’s Partner Companies
New employees visited Taisei Weld and Ushikoshi to learn how precision welding and metal fabrication support Samco’s semiconductor systems.
Virginia Commonwealth University EMBA Students Visit Samco for Global Business and Kyoto Management Insights
VCU EMBA students visited Samco in Kyoto, exploring its history, semiconductor manufacturing processes, and unique Kyoto approach to business and management.
IMiF Expands GaN Research Capability for Power Devices with Samco ICP-RIE Platform
Samco systems support IMiF’s GaN pilot line, enabling precise AlGaN/GaN etching and advancing wide bandgap semiconductor research in Europe.
Stable Device Isolation Processing for 6-Inch GaN-Based Power Devices
GaN device isolation etching using ICP-RIE and endpoint detection enables uniform processing and stable multi-wafer semiconductor production.
DTU Selects Samco Plasma Etching System for Quantum Photonics Research
The Technical University of Denmark selects Samco’s RIE-400iP plasma etching system for quantum photonics research, enabling precise III-V processing for single-photon device development.
Innovation Center of NanoMedicine (iCONM): Professor Kazunori Kataoka
Professor Kazunori Kataoka presents nanomachine-based drug delivery and the vision of “in-body hospitals” at the 2025 Samco Foundation lecture.
Samco Strengthens Strategic Collaboration with ITRI Taiwan
Samco expands partnership with ITRI Taiwan, focusing on semiconductor processing, silicon photonics, and chiplet integration through joint R&D efforts.
Chairman Osamu Tsuji Awarded Honorary Doctorate by Kyoto Institute of Technology
Samco Chairman Osamu Tsuji received an Honorary Doctorate from Kyoto Institute of Technology in recognition of his contributions to education and research.
Atomic Layer Etching Control – Intro to ALE Systems
Introducing Samco’s Atomic Layer Etching (ALE) systems, detailing precise low-bias control and fast gas switching for uniform, low-damage etching processes.
Kyushu Institute of Technology: Professor Akiyoshi Baba
Prof. Akiyoshi Baba shares insights on CMOS/MEMS research and managing Japan’s leading open-access semiconductor facility at Kyutech’s Iizuka Campus.
University of Adelaide to Install RIE-400iP-ALE as Australia’s First ALE System
Samco’s RIE-400iP-ALE will become Australia’s first Atomic Layer Etching system, advancing III-V semiconductor and photonics research at the University of Adelaide.
Invited Lecture at IIT Delhi Delivered by Samco Inc. Founder Osamu Tsuji
Samco founder Osamu Tsuji delivered an invited lecture at IIT Delhi on Plasma CVD, ALD, and the future of thin film technologies in semiconductor research.
Samco Signs MoU with IIT Delhi to Advance Academic and Research Collaboration
Samco signs an MoU with IIT Delhi to expand academic and research collaboration, supporting technology exchange and joint initiatives in advanced engineering.
The Anode/Cathode Switching Function of Samco’s PECVD System PD-200STL
PECVD System PD-200STL with anode/cathode switching allows for multitude of deposition conditions and demonstrates versatility of applications.
Samco Inc. Completes Construction of New Advanced Technology Development Center
Samco opens its new Advanced Technology Development Center in Kyoto, featuring a Class 1,000 cleanroom to drive next-gen semiconductor innovation.
TOWA and Samco Successfully Host “Kyoto Day” Technical Seminar in New Delhi
TOWA and Samco co-hosted Kyoto Day in New Delhi, sharing Japan’s semiconductor innovations to support India’s growing semiconductor industry.
TOWA and Samco to Host “Kyoto Day” in New Delhi Ahead of SEMICON India 2025
Kyoto Day in New Delhi brings TOWA and Samco together to showcase semiconductor innovations ahead of SEMICON India 2025.
Simultaneous Double-sided Wafer Deposition via Plasma Enhanced ALD
Report investigating simultaneous dual-surface deposition of AlOx films on silicon wafers using the Plasma Enhanced Atomic Layer Deposition (PEALD) technique.
Samco Inc. donates to the Red Cross Society
Samco Inc. donates 10 million JPY to the Japanese Red Cross Society, continuing its annual support for disaster relief and humanitarian efforts.
AJOU University Students Visit Samco for Industry Insights
Ajou University students visit Samco for a hands-on look at semiconductor manufacturing and a Q&A session with CEO Osamu Tsuji during their Japan study tour.
Ohio State University Students Visit Samco Inc. Headquarters
Samco welcomed Ohio State University students to Kyoto HQ. The students explored Samco’s history and learned about the semiconductor manufacturing field.
Institute of Science Tokyo: Professor Yasuyuki Miyamoto
Advancing high-speed transistors with InP and GaN, Professor Yasuyuki Miyamoto explores the future of compound semiconductors and shares insights on Samco’s key role in research.
Special Lecture on GaN Technology by Nagoya University Professor Jun Suda
Professor Jun Suda of Nagoya University gave a special lecture at Samco on GaN devices, sharing insights on materials, processing, and future technologies.
Samco featured in TIME Magazine: Taking a Quantum Leap
TIME magazine features Samco’s journey from a Kyoto garage startup to a global semiconductor equipment leader in the article “Taking a Quantum Leap.”
Indian Students from Kyoto University’s KU-STAR Program Visit Samco
Samco welcomed KU-STAR Program students from top Indian universities for a factory tour, tech talk, and cultural exchange during their academic stay in Kyoto.
Kyushu University – CSeDE: Professor Reiji Hattori
Research at Kyushu University explores next-gen display electronics, from AR/VR and micro-LEDs to retinal scanning and semiconductor devices.
Samco Strengthens Collaboration with IIT Delhi, Advancing Japan-India Technology and Talent Exchange
Samco strengthens collaboration with IIT Delhi to advance Japan–India technology exchange, energy research, and talent development.
Introduction of the Single-Wafer Aqua Plasma® System
Samco’s single-wafer Aqua Plasma® system for wafer cleaning and descum processes, delivering improved ashing rates, uniformity, and throughput.
Cornell University EMBA Students Visit Samco Inc. to Explore Innovation and Semiconductor Leadership in Japan
Cornell EMBA students visited Samco’s Kyoto headquarters to explore semiconductor innovation, leadership, and cross-cultural business insights.
MIT’s Dr. Tomás Palacios Visits Samco to Explore Future Microelectronics Innovations
MIT Professor Tomás Palacios visited Samco to discuss next-generation microelectronics, advanced materials, and potential research collaboration.
What is Atomic Layer Deposition (ALD)?
Learn the fundamentals of Atomic Layer Deposition (ALD), a thin-film technique enabling atomic-scale thickness control, conformal coatings, and high-quality films.
Northwestern University – NUFAB: Nasir Basit, PhD.
Micro- and nanoscale device research, deposition and etching processes using RIE and PECVD for advanced structures.
ICP Etching Process for Realizing SiC Trench MOSFETs
Advanced ICP trench etching for SiC MOSFETs achieving over 700 nm/min etch rates, rounded trench bottoms, and high uniformity on 6-inch wafers.
National Institute of Advanced Industrial Science and Technology (AIST): Takahiro Mori Ph.D.
Research on silicon spin qubits for quantum computing, using PD-2201LC, RIE-400iPC, and RIE-230LC.
UV-Ozone Cleaning: Fundamentals, Advantages, and Applications
Learn how UV-ozone cleaning works, its advantages over plasma cleaning, and applications in semiconductor surface preparation and materials research.
Part 4 – Loading Effect and Microloading Effect in Silicon Deep Reactive Ion Etching
Explore loading and microloading effects in silicon DRIE and how process optimization improves etch uniformity and depth control in MEMS fabrication.
Surface Treatment of Gold Using Aqua Plasma®
Aqua Plasma® treatment prevents oxidation, reduces gold surface oxides, and improves hydrophilicity for semiconductor manufacturing processes.
Part 3 – Equipment Advances for the Bosch Process
Learn key Bosch process hardware advances (including ICP source design, RF power control, fast gas switching, and pumping) to improve Si DRIE performance and profiles.
AlGaN/GaN Etch Challenges for GaN Power Device Fabrication
Key etching challenges in AlGaN/GaN power device fabrication and solutions for precise plasma etching of GaN-based semiconductor structures.
Part 2 – What is the Bosch Process (Deep Reactive Ion Etching)?
Learn how the Bosch process enables deep silicon DRIE with high aspect ratio features, using cyclic deposition and etching steps for anisotropic profiles and high selectivity.
Long-Term Process Stability of “PD-220 Series” Systems
Long-term data shows stable SiN deposition using Samco’s PD-220 plasma CVD systems, maintaining ±2% uniformity over six months with reduced maintenance downtime.
ICFO: Dr. Johann Osmond
Nanophotonics research, advanced applications, and the role of RIE-10NR in ICFO’s photonics projects.
Part 1 – Introduction to Si DRIE (Silicon Deep Reactive Ion Etching)
An introduction to Si DRIE, comparing Bosch, non-Bosch, and cryogenic processes and how Samco systems support MEMS, TSV, and packaging applications.
Innovation with the New Plasma Source HSTC-M™
Samco introduces the HSTC-M™ plasma source for uniform, stable ICP etching of SiC and GaN power devices up to 8-inch wafers across research and production systems.
RIKEN: Dr. Takuo Tanaka
Optical metamaterials research, including nanostructures for light manipulation and high-sensitivity molecular detection, using Samco’s RIE-400iP.
Samco Announces Sale of Advanced Etching Systems to III-V Lab in Europe
Samco announces the sale of two RIE-400iP ICP-RIE systems to France-based III-V Lab to support advanced III-V semiconductor and silicon integration research.
FORTUNE Magazine: Kyoto’s Semiconductor Success
Samco is featured in FORTUNE Businessweek on Kyoto’s semiconductor strength, highlighting Samco’s global growth, R&D expansion, and innovation rooted in Kyoto.
Toyohashi University of Technology: Dr. Hiroto Sekiguchi
Bio-implantable microLED devices using RIE-200NL and PD-220NL systems.
Introduction of the Three-Chamber CVD System PD-2203LC
Overview of three-chamber CVD system PD-2203LC, enabling stable SiN/SiO2 deposition with flexible frequency options for research and production.
RIE-10NR Achieves Sales Milestone of 500 Units
Samco’s RIE-10NR CCP-RIE system surpasses 500 units shipped, marking a major milestone for a widely adopted etching tool in global research and development.
Osaka Metropolitan University: Professor Masataka Higashiwaki, Ph.D.
Research on Ga₂O₃ devices using RIE-200NL and other systems.
Samco and Eastern Switzerland University of Applied Sciences (OST) Announce Collaboration for Research Advancements
Samco and OST launch a partnership to support European R&D, providing RIE-10NR and UV-2 systems for microtechnology and photonics research in Switzerland.
Samco Inc. to Construct Third R&D Facility as Demand Surges for Innovative Semiconductor Equipment
Samco announces plans to build a third R&D facility near its Kyoto headquarters, expanding cleanroom capacity to accelerate semiconductor equipment innovation.
Hokkaido University: Professor Yasutaka Matsuo
Nano, micro-fabrication technology and materials development and thermal ALD for photochemistry.
Aqua Plasma Boost® and AQ-2000BT: Excellent for Reducing Large Sized Samples of Oxidized Copper
Samco developed Aqua Plasma Boost® to enhance oxidized copper reduction using reducing gas and water vapor.
Kyushu University (I²CNER): Dr. Shigenori Fujikawa
Aqua Plasma® used for surface
modification of CO2 separation
nanomembranes.
The University of Tokyo: Dr. Satoshi Iwamoto and Photonics Research
Topological, diamond, and quantum nanophotonics, redefining light control and driving next-generation photonic innovation.
Application of Aqua Plasma® for Microbumps
Samco’s Aqua Plasma® improves microbump fabrication by enhancing photoresist and Cu hydrophilization, preventing oxidation, and enabling better plating solution penetration for fine patterns.
New Approach for Trench Type SiC MOSFET
A new trench-type SiC MOSFET fabrication approach combining ICP dry etching and ALD/PECVD gate insulators for improved breakdown and device performance.