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  • Products
    • Deposition Systems
      • Atomic Layer Deposition (ALD)
      • Anode PECVD
      • Cathode PECVD
    • Etching Systems
      • Atomic Layer Etching (ALE)
      • Inductively Coupled Plasma (ICP) Etching
      • Si Deep Reactive Ion Etching (DRIE)
      • Reactive Ion Etching (RIE) – Plasma Etching
      • Xenon Difluoride (XeF2) Etching
    • Surface Treatment Systems
      • Aqua Plasma®
      • Plasma Cleaning
      • UV Ozone Cleaning
  • Processes
    • Deposition
      • Atomic Layer Deposition (ALD)
      • Anode PECVD
      • Cathode PECVD
    • Etching
      • Atomic Layer Etching (ALE)
      • Compound Semiconductor Etching
        • GaN Etching
        • GaAs Etching
        • InP Etching
      • Silicon Etching & DRIE
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      • Plasma Cleaning
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September 1, 2026

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  4. 01

Headshot of Dr. Shigehito Miki, Deputy Director, Advanced ICT Device R&D Promotion Center, NICT

Superconductive ICT Device Lab (NICT): Shigehito Miki, Ph.D.

InterviewsBy MeganSeptember 1, 2026

Discover how superconducting nanostrip single-photon detectors are advancing quantum communication, computing, LiDAR, and deep-space research.

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