• SAMCO Wafer Transfer Robot
  • SAMCO RIE-10NR
  • SAMCO UV-Ozone

Semiconductor Equipment
– PECVD, Plasma Etching & Surface Treatment –
for R&D and Production

company history, core technologies & more

process equipment for
deposition, etching & surface treatment

plasma etch & PECVD process solutions
for device labs & fabs

experienced etch & PECVD technologies
of Si, SiO2, SiNx, III-V, metals & more

Product Portfolio

Deposition Icon
Etching Icon
Surface Treatment

Plasma Etching & PECVD Process Solutions

DRIE for MEMS fabrication
Plasma Dicing of Silicon and III-V (GaAs/InP/GaN)
GaN Power Device
HB LED
SiC trench etching for SiC power device
Photoresist Removal
Low temperature PECVD for SiO2 and SiN plasma deposition
Cathode PECVD
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  • SAMCO Engineer

About SAMCO

SAMCO Inc. is a semiconductor equipment company that provides process systems for both R&D and production. As a pioneer in the industry we have developed advanced process solutions using technologies such as Atomic Layer Deposition (ALD), Plasma Enhanced Chemical Vapor Deposition (PECVD), Metal Organic Chemical Vapor Deposition (MOCVD), Reactive Ion Etch (RIE), Inductively Coupled Plasma (ICP), and UV-Ozone Cleaning.

SAMCO Inc. possesses over 35 years of process knowledge, and experience in providing cutting edge, extremely reliable deposition, etching, cleaning and surface treatment systems to our customers in the worldwide electronics industry. We take pride in partnering with our customers to achieve the most challenging process goals.

Latest NEWS & Events

Visit Samco’s Booth at MEMS 2017 Conference
We have a booth to show our latest MEMS fabrication technologies including deep silicon etch, RIE, ICP-RIE, PECVD, plasma ashing and XeF2 MEMS release. We are looking forward to discussion on our process technologies and capabilities.
Samco MEMS Workshop in New Delhi, India
This workshop at IIT Delhi aims at providing a broad overview on MEMS & NEMS plasma applications which are fundamental techniques for nanofabrication in R&D.
Samco SiC Power Device Seminar in Shanghai, China
This seminar’s main theme is “Process Technology and Applications of New Generation SiC Power Devices”.

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