– PECVD, Plasma Etching & Surface Treatment –
for R&D and Production
SAMCO Inc. is a semiconductor equipment company that provides process systems for both R&D and production. As a pioneer in the industry we have developed advanced process solutions using technologies such as Atomic Layer Deposition (ALD), Plasma Enhanced Chemical Vapor Deposition (PECVD), Metal Organic Chemical Vapor Deposition (MOCVD), Reactive Ion Etch (RIE), Inductively Coupled Plasma (ICP), and UV-Ozone Cleaning.
SAMCO Inc. possesses over 35 years of process knowledge, and experience in providing cutting edge, extremely reliable deposition, etching, cleaning and surface treatment systems to our customers in the worldwide electronics industry. We take pride in partnering with our customers to achieve the most challenging process goals.
Come see us at the International Symposium for Testing and Failure Analysis 2016 exhibition which will be held at the Fort Worth Convention Center in Fort Worth, Texas, USA
We have a poster presentation titled “Deep GaAs Etching with V-shaped Trench Profile Using Inductively Coupled Plasma Technology“.