– PECVD, Plasma Etching & Surface Treatment –
for R&D and Production
company history, core technologies & more
process equipment for
deposition, etching & surface treatment
plasma etch & PECVD process solutions
for device labs & fabs
experienced etch & PECVD technologies
of Si, SiO2, SiNx, III-V, metals & more
Material Processing Data (Plasma Etch & PECVD)
SAMCO Inc. is a semiconductor equipment company that provides process systems for both R&D and production. As a pioneer in the industry we have developed advanced process solutions using technologies such as Atomic Layer Deposition (ALD), Plasma Enhanced Chemical Vapor Deposition (PECVD), Metal Organic Chemical Vapor Deposition (MOCVD), Reactive Ion Etch (RIE), Inductively Coupled Plasma (ICP), and UV-Ozone Cleaning.
SAMCO Inc. possesses over 35 years of process knowledge, and experience in providing cutting edge, extremely reliable deposition, etching, cleaning and surface treatment systems to our customers in the worldwide electronics industry. We take pride in partnering with our customers to achieve the most challenging process goals.
Latest NEWS & Events
We have a booth to show our latest MEMS fabrication technologies including deep silicon etch, RIE, ICP-RIE, PECVD, plasma ashing and XeF2 MEMS release. We are looking forward to discussion on our process technologies and capabilities.