• SAMCO Wafer Transfer Robot
  • SAMCO UV-Ozone

Semiconductor Equipment
– PECVD, Plasma Etching & Surface Treatment –
for R&D and Production

company history, core technologies & more

process equipment for
deposition, etching & surface treatment

plasma etch & PECVD process solutions
for device labs & fabs

experienced etch & PECVD technologies
of Si, SiO2, SiNx, III-V, metals & more

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Product Portfolio

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Surface Treatment

Plasma Etching & PECVD Process Solutions

DRIE for MEMS fabrication
Plasma Dicing of Silicon and III-V (GaAs/InP/GaN)
GaN Power Device
SiC trench etching for SiC power device
Photoresist Removal
Low temperature PECVD for SiO2 and SiN plasma deposition
Cathode PECVD
  • SAMCO Engineer

About Samco

Samco Inc. is a semiconductor equipment company that provides process systems for both R&D and production. As a pioneer in the industry, we have developed advanced process solutions using technologies such as Atomic Layer Deposition (ALD), Plasma Enhanced Chemical Vapor Deposition (PECVD), Reactive Ion Etch (RIE), Inductively Coupled Plasma (ICP) Etch, and UV-Ozone Cleaning.

Samco possesses over 40 years of process knowledge, and experience in providing cutting edge, extremely reliable deposition, etching, cleaning and surface treatment systems to our customers in the worldwide electronics industry. We take pride in partnering with our customers to achieve the most challenging process goals.

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