A 70% Reduction in Takt Time: Intro to Plasma CVD System PD-2201HLC
New PD-2201HLC plasma CVD system cuts takt time by 70% while maintaining high deposition rates, film uniformity, and repeatability.
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Samco Inc.
USA Website Next Gen
New PD-2201HLC plasma CVD system cuts takt time by 70% while maintaining high deposition rates, film uniformity, and repeatability.