Hierarchically nanostructured boron-doped diamond electrode surface

Takeshi Kondo^{a, b, c}, Keita Yajima^a, Tsuyoshi Kato^a, Masahiro Okano^d, Chiaki Terashima^{b, c}, Tatsuo Aikawa^a, Masanori Hayase^{b, d}, Makoto Yuasa^{a, b, c}

^a Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
^b Research Institute for Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
^c ACT-C/JST, 4-1-8 Honcho, Kawaguchi, Saitama 333-0012, Japan
^d Department of Mechanical Engineering, Faculty of Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
Diamond and Related Materials (2016)
A boron-doped diamond (BDD) electrode with a large specific surface area was fabricated. The combination of thermal treatment and whisker formation by diamond plasma etching was employed for nano-texturing of diamond surfaces. Samco open-load Reactive Ion Etcher, RIE-10NR was used for diamond plasma etching process.

For more details of our diamond plasma etching technologies and capabilities, please visit the process data page below.
Diamond Plasma Etching (RIE and ICP Etch)