Category: 2016 Customer

07 Jan

Scientific Paper on Silicon 3D Nanotructure Fabrication Using SAMCO DRIE System from Osaka University and Nara Institute of Science and Technology Group

Samco 2016 Customer, Samco Customer Publication, Si DRIE, Silicon/Dielectrics Etch

Creation of atomically flat Si{111}7 × 7 side-surfaces on a three-dimensionally-architected Si(110) substrate

Azusa N. Hattoria, Ken Hattorib, Shohei Takemotob, Hiroshi Daimonb and Hidekazu Tanakaa
a Nanoscience and Nanotechnology Center, The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihoga-oka, Ibaraki, Osaka 567-0047, Japan
b Graduate School of Materials Science, Nara Institute of Science and Technology, Takayama 8916-5, Ikoma, Nara 630-0192, Japan
Surface Science (2016) 644, 86–90

Samco silicon DRIE System was used for deep silicon etching to fabricate three-dimensional (3D) nanostructures.

For more details of our deep silicon etching capabilities, please visit the process data pages below.
Deep Silicon Trench/Via Hole Etching using Bosch Process
Si DRIE (Deep Reactive Ion Etching) for MEMS and TSV

07 Jan

Scientific Paper on Nanoparticle Fabrication Using SAMCO UV-Ozone System from The City College of New York

Samco 2016 Customer, ITO, Samco Customer Publication, Surface Treatment, UV-Ozone

Electrostatically assisted fabrication of silver–dielectric core/shell nanoparticles thin film capacitor with uniform metal nanoparticle distribution and controlled spacing

Xue Lia, b, Olivia Niitsooa and Alexander Couzisa
a Department of Chemical Engineering, The City College of New York, NY 10031, United States
b Department of Chemical and Biomolecular Engineering, Lehigh University, Bethelehem, PA 18015, United States
Journal of Colloid and Interface Science (2016) 465, 333–341

Samco UV-Ozone cleaner at the City College of New York was used for UV-Ozone surface cleaning of ITO substrates before nanoparticle deposition.