Improving the Brightness and Reliability of InGaN/GaN Near Ultraviolet Light Emitting Diodes by Controlling the Morphology of the GaN Buffer Layer

S. C. Tsai, H. C. Fang, C. H. Lu and Y. L. Lai
National Cheng Kung University, Tainan, Taiwan
Journal of Display Technology (2016) (Volume:PP , Issue: 99 )

Samco ICP etch system at National Cheng Kung University was used for InGaN/GaN dry etching in UV LED fabrication.
For our process capabilities of GaN dry etching, please visit the process data page below.
GaN Dry Etching Process (RIE or ICP-RIE)

Controlled superficial assembly of DNA–amorphous calcium phosphate nanocomposite spheres for surface-mediated gene delivery

Ayako Oyanea^a, Hiroko Araki^a, Maki Nakamura^a, Yoshiki Shimizu^a, Quazi T.H. Shubhra^a, Atsuo Ito^b, Hideo Tsurushima^{a, c}

^a Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
^b Health Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central 6, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8566, Japan
^c Department of Neurosurgery, Faculty of Medicine, University of Tsukuba, 1-1-1 Tennoudai, Tsukuba, Ibaraki 305-8575, Japan

SAMCO table-top RIE systsm was used for surface modification of polystyrene substrates in an oxygen plasma.

300-nm Imperceptible, Ultraflexible, and Biocompatible e-Skin Fit with Tactile Sensors and Organic Transistors

Robert A. Nawrocki¹, Naoji Matsuhisa^1,2, Tomoyuki Yokota¹ and Takao Someya^1
1 Department of Electrical Engineering and Information Systems, School of Engineering, The University of Tokyo, Bunkyo-ku, Tokyo, Japan
² Advanced Leading Graduate Course for Photon Science, Bunkyo-ku, Tokyo, Japan
Advanced Electronic Materials (2016)

Samco open-load RIE etcher was used for contact hole formation of encapsulation layers.

ITO-Based MEMS Sensor Electrode for Dynamic Cow-Rumen pH Sensing

Lan Zhang¹, Jian Lu¹, Hirofumi Nogami^{1, 2}, Hironao Okada², Toshihiro Itoh^{1, 3}

¹ Research Center for Ubiquitous MEMS and Micro Engineering (UMEMSME), National Institute of Advanced Industrial Science and Technology (AIST)
² Department of Mechanical Engineering, Kyushu University
³ Department of Human and Engineered Environmental Studies, the University of Tokyo
IEEJ Transactions on Sensors and Micromachines (2016) 136, No. 11 P 482-487
A PH sensor was fabricated combining a metal-oxide-semiconductor field-effect transistor (MOSFET) with a separate sensing electrode made of indium tin oxide (ITO) film. Samco RIE etch system was used for plasma etching of an amorphous fluoropolymer CYTOP fluoropolymer film in device fabrication.

Novel Nano-Device to Measure Voltage-Driven Membrane Transporter Activity

Rikiya Watanabe, Naoki Soga, and Hiroyuki Noji
Dept. of Appl. Chem., Univ. of Tokyo, Tokyo, Japan
IEEE TRANSACTIONS ON NANOTECHNOLOGY (2016) 15, NO. 1

SAMCO open-load Reactive Ion Etching Tool was used for patterning of carbon-fluorine hydrophobic polymer (CYTOP) by dry etching of the layer against photoresist.

Microfluidic chips for forward blood typing performed with a multichannel waveguide-mode sensor

Hiroki Ashiba^a, Makoto Fujimaki^a, Koichi Awazuv, Torahiko Tanaka^b and Makoto Makishima^b
a Electronics and Photonic Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
^b Division of Biochemistry, Department of Biomedical Sciences, Nihon University School of Medicine, 30-1 Oyaguchi-kamicho, Itabashi, Tokyo 173-8610, Japan
Sensing and Bio-Sensing Research 2016 Volume 7, March 2016, Pages 121-126

Samco ICP etcher was used to fabricate a mold template of microfluidic chips by silicon plasma etching.

For our process capabilities of silicon plasma etching, please visit the process data page below.
Si Dry Etching Process (RIE, ICP-RIE or XeF₂ Etch)

Vacuum Ultraviolet Treatment of Self-Assembled Monolayers: A Tool for Understanding Growth and Tuning Charge Transport in Organic Field-Effect Transistors

Pollawat Prisawong, Peter Zalar, Amir Reuveny, Naoji Matsuhisa, Wonryung Lee, Tomoyuki Yokota, and Takao Someya
Department of Electrical Engineering, University of Tokyo
Adv. Mater. (2016) 28: 2049–2054

Samco plasma cleaner was used for oxygen plasma cleaning during sample preparation.

Enhancement of microfluidic particle separation using cross-flow filters with hydrodynamic focusing

Yun-Yen Chiu, Chen-Kang Huang, and Yen-Wen Lu
Department of Bio-Industrial Mechatronics Engineering, National Taiwan University, Taipei 10617, Taiwan, Republic of China
Biomicrofluidics (2016) 10, 011906

Samco silicon DRIE system at National Taiwan University was used for microchannel fabrication with crossflow filtration mechanism.

For more details of our deep silicon etching capabilities, please visit the process data pages below.
Deep Silicon Trench/Via Hole Etching using Bosch Process
Si DRIE (Deep Reactive Ion Etching) for MEMS and TSV

Constrained spheroids for prolonged hepatocyte culture

Wen Hao Tong^{a, b, c}, Yu Fang^{a, b, c}, Jie Yan^{a, c, g}, Xin Hong^c, Nisha Hari Singh^a,
Shu Rui Wang^d, Bramasta Nugraha^{a, b, e, f}, Lei Xi^{a c}, Eliza Li Shan Fong^c,
Ciprian Iliescu^a, Hanry Yu^{a, b, c, g, h, i},
^a Institute of Biotechnology and Nanotechnology, A*STAR, The Nanos, #04-01, 31 Biopolis Way, Singapore 138669, Singapore
^b NUS Graduate School for Integrative Sciences and Engineering, Centre for Life Sciences (CeLS), #05-01, 28 Medical Drive, Singapore 117456, Singapore
^c Department of Physiology, Yong Loo Lin School of Medicine, MD9-03-03, 2 Medical Drive, Singapore 117597, Singapore
^d Bruker Singapore Pte Ltd., 11 Biopolis Way #10-10, The Helios, Singapore 138667, Singapore
^e ETH Zürich, Department of Biosystem Science and Engineering (D-BSSE), Mattenstrasse 26, CH-4058 Basel, Switzerland
^f Roche Pharmaceutical Research and Early Development, Department of Discovery Technology, Roche Innovation Center Basel, Grenzacherstrasse 124,
CH-4070 Basel, Switzerland
^g Singapore-MIT Alliance for Research and Technology, 1 CREATE Way, #10-01 CREATE Tower, Singapore 138602, Singapore
^h Mechanobiology Institute, National University of Singapore, T-Lab, #05-01, 5A Engineering Drive 1, Singapore 117411, Singapore
ⁱ Department of Biological Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
Biomaterials (2016) 80 106e120

Samco Basic Plasma Kit was used for surface oxidation of Parylene C membrane in O2 plasma in sample preparation.

Photonic nanojet induced modes generated by a chain of dielectric microdisks

Cheng-Yang Liu, Chun-Ci Li
Department of Mechanical and Electro-Mechanical Engineering, Tamkang University, New Taipei City, Taiwan
Optik – International Journal for Light and Electron Optics (2016) 127, 1, pp 267–27

Samco Reactive Ion Etching (RIE) system was used for dielectric layer etching to fabricate a microdisc device.