Scalable Fabrication of Nanogratings on GaP for Efficient Diffraction of Near-Infrared Pulses and Enhanced Terahertz Generation by Optical Rectification

Mohammad Bashirpour¹, Wei Cui¹, Angela Gamouras^1,2 and Jean-Michel Ménard^1,2
1 Department of Physics, University of Ottawa, Ottawa, ON K1N 7N9, Canada
² National Research Council Canada, Ottawa, ON K1A 0R6, Canada
Crystals 2022, 12, 684. https://doi.org/10.3390/cryst12050684

Samco RIE system RIE-10NR was used for SiO2 hardmask patterning using photoresist mask. Then, Samco ICP-RIE system was used for GaP etching using the SiO2 hardmask for wafer-scale fabrication of a surface phase grating with submicron feature sizes.

Highly selective etch of silicon dioxide with tungsten hard mask deposited by PVD process

Yuanhui Fang, Jian Zhang, Yu-Long Jiang
School of Microelectronics, Fudan University, Shanghai 200433, China
2018 18th International Workshop on Junction Technology (IWJT), Shanghai, 2018, pp. 1-3.

Samco RIE Plasma Etching Equipment was used for tungsten etching and SiO2 etching with the tungsten hardmask.

Identifying DNA methylation in a nanochannel

Xiaoyin Sun^a,b, Takao Yasui^a,b,c, Takeshi Yanagida^d,e, Noritada Kaji^a,b, Sakon Rahong^a,b, Masaki Kanai^d, Kazuki Nagashima^d, Tomoji Kawai^e and Yoshinobu Baba^a,b,f
a Department of Applied Chemistry, Graduate School of Engineering, Nagoya University, Nagoya, Japan;
^b ImPAC T Research Center for Advanced Nanobiodevices, Nagoya University, Nagoya, Japan;
^c Japan Science and Technology Agency (JST), PRESTO, Saitama, Japan;
^d Institute of Materials Chemistry and Engineering, Kyushu University, Fukuoka, Japan;
^e Institute of Scientific and Industrial Research, Osaka University, Osaka, Japan;
^f Health Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Takamatsu, Japan
Science and Technology of Advanced Materials (2016) VOL . 17, NO . 1, 644–649

A new method to analyze DNA methylation was proposed using a nano-channel device in this research. Samco RIE etch tool was used for  quartz plasma etching over Cr hard mask to fabricate nano-channel structures. The nano-channel device is effective to detect single DNA molecule.

For more details of our SiO₂ (quartz) plasma etching capabilities, please visit the process data page below.
SiO₂ Plasma Etching Process (RIE and ICP Etch)

Multiplexed immunosensing and kinetics monitoring in nanofluidic devices with highly enhanced target capture efficiency

Yii-Lih Lin^1,2,3, Yen-Jun Huang^3,4, Pattamon Teerapanich^5,6, Thierry Leïchlé^5,6 and Chia-Fu Chou^2,3
1 Department of Chemistry, National Taiwan University, Taipei, Taiwan
² Nano Science and Technology Program, Taiwan International Graduate Program, Academia Sinica and National Taiwan University, Taipei, Taiwan
³ Institute of Physics, Academia Sinica, Taipei, Taiwan
⁴ Department of Physics, National Taiwan University, Taipei, Taiwan
⁵ LAAS-CNRS, 7 Avenue du Colonel Roche, F-31077 Toulouse, France
⁶ Université de Toulouse, F-31077 Toulouse, France
Biomicrofluidics 10, 034114 (2016)

Samco ICP etch system, RIE-10iP was used for nano-slit pattern fabrication by fused quartz plasma etching.

For our process capabilities of SiO₂ and quartz plasma etching, please visit the process data page below.
SiO₂ Dry Etching Process (RIE or ICP-RIE)

Photonic nanojet induced modes generated by a chain of dielectric microdisks

Cheng-Yang Liu, Chun-Ci Li
Department of Mechanical and Electro-Mechanical Engineering, Tamkang University, New Taipei City, Taiwan
Optik – International Journal for Light and Electron Optics (2016) 127, 1, pp 267–27

Samco Reactive Ion Etching (RIE) system was used for dielectric layer etching to fabricate a microdisc device.

Coherent diffraction imaging of non-isolated object with apodized illumination

Krishna P. Khakurel^1,2, Takashi Kimura^1,2,3, Yasumasa Joti⁴, Satoshi Matsuyama^3,4, Kazuto Yamauchi^3,4 and Yoshinori Nishino^1,2,3
1Research Institute for Electronic Science, Hokkaido University, Kita 21, Nishi 10, Kita-ku, Sapporo, Hokkaido, 001-0021, Japan
²Graduate School of Information Science, Hokkaido University, Kita 21, Nishi 10, Kita-ku, Sapporo, Hokkaido, 001-0021, Japan
³Japan Science and Technology Agency, CREST, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan
⁴Japan Synchrotron Radiation Research Institute/SPring-8, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan
⁵Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1, Yamadaoka, Suita, Osaka 565-0871, Japan
Optics Express (2015) 23, 22, pp. 28182-28190

SAMCO RIE plasma etcher at Hokkaido University was used for fabrication of coherent diffraction imaging samples.

Electrophoretic displays driven by all-oxide thin-film transistor backplanes fabricated using a solution process

Satoshi Inoue, Tue Trong Phan, Tomoko Hori, Hiroaki Koyama and Tatsuya Shimoda
Green Device Research Center, Japan Advanced Institute of Science and Technology, Ishikawa 923-1211, Japan
physica status solidi (a) Volume 212, Issue 10, pages 2133–2140, October 2015

Samco ICP etching system was used for plasma etching of the Ruthenium Oxide (RuO₂), Zr-In-Zn-O (ZIZO), Silicon Dioxide (SiO₂) and Indium Tin Oxide (ITO) films.

Our process capabilites of SiO₂ dry etching can be found in the page below.
SiO₂ Dry Etching Process (RIE or ICP-RIE)

Three-dimensional Nanowire Structures for Ultra-Fast Separation of DNA, Protein and RNA Molecules

Sakon Rahong^1,2, Takao Yasui^2,3, Takeshi Yanagida⁴, Kazuki Nagashima⁴, Masaki Kanai⁴,
Gang Meng⁴, Yong He⁴, Fuwei Zhuge⁴, Noritada Kaji^2,3, Tomoji Kawai⁴ & Yoshinobu Baba^1,2,3,5
1 Institute of Innovation for Future Society, Nagoya University, JAPAN.
² FIRST Research Center for Innovative Nanobiodevices, Nagoya University, JAPAN.
³ Department of Applied Chemistry, Graduate School of Engineering, Nagoya University, JAPAN.
⁴ The Institute of Scientific and Industrial Research, Osaka University, JAPAN.
⁵ Health Research Institute, National Institute of Advanced Industrial Science and. Technology (AIST), JAPAN.
Scientific Reports 5, Article number: 10584 (2015) doi:10.1038/srep10584

SAMCO Reactive Ion Etching System RIE-10NR was used for SiO₂ plasma etching over Cr mask. This process is used for micro-channel fabrication on microfluidic system which enables ultra-fast separation of biomolecules (DNA, Protein and RNA Molecules).

For our process examples and capabilities of SiO₂ plasma etching, please visit the process data page below.
SiO₂ Dry Etching Process (RIE or ICP-RIE)

Buckling behavior of piezoelectric diaphragms for highly sensitive structures of ultrasonic microsensors controlled through intrinsic stress of PZT films

Yamashita, K.; Arai, K.; Tanaka, H.; Nishiumi, T.; Noda, M.
Graduate School of Science & Technology, Kyoto Institute of Technology, Kyoto, Japan
presented at Applications of Ferroelectric, International Symposium on Integrated Functionalities and Piezoelectric Force Microscopy Workshop (ISAF/ISIF/PFM), 2015 Joint IEEE International Symposium on the , vol., no., pp.44-47, 24-27 May 2015

SAMCO silicon DRIE system at Kyoto Institute of Technology was used for Silicon Dioxide (SiO₂) dry etching.
Our DRIE systems are equipped with SiO₂ etch kit for high-speed SiO₂ plasma etching. For more details, please visit our product page below.
Silicon Deep Reactive Ion Etching (DRIE) Systems

Also, for our process capabilities of SiO₂ plasma etching, please visit the process data page below.
SiO₂ Plasma Etching Process Data (RIE or ICP Etch)

Performance of SU-8 Membrane Suitable for Deep X-Ray Grayscale Lithography

Harutaka Mekaru
Research Center for Ubiquitous MEMS and Micro Engineering (UMEMSME), National Institute of
Advanced Industrial Science and Technology (AIST), 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan
Micromachines 2015, 6, 252-265

Samco open-load Plasma Etching System (RIE etcher) was used for SiO₂ dry etching in the device fabrication. The SiO₂ layer was successfully removed without breaking the SU-8 membrane.

For our process capabilities of SiO₂ dry etching, please visit the page below.
SiO₂ Dry Etching Process (RIE or ICP-RIE)