Category: 2021 Customer

12 Apr

Scientific Paper on boron-doped diamond electrode from Chinese Academy of Sciences

Samco 2021 Customer, Diamond Etch, Other Materials Etch, Samco Customer Publication

Effect of oxygen terminated surface of boron-doped diamond thin-film electrode on seawater salinity sensing

Dan Shi a,b, Lusheng Liu a, Zhaofeng Zhai a, Bin Chen a,b, Zhigang Lu a,b, Chuyan Zhang a,c, Ziyao Yuan a,b, Meiqi Zhou a,b, Bing Yang a , Nan Huang a and Xin Jiang a,c
a Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, 110016, China
b School of Materials Science and Engineering, University of Science and Technology of China, Shenyang, 110016, China
c Institute of Materials Engineering, University of Siegen, Paul-Bonatz-Str. 9-11, Siegen, 57076, Germany
Journal of Materials Science & Technology, Volume 86, Pages 1-10 (2021)

Boron-doped diamond is an interesting material for sensing application. Samco open-load RIE system RIE-10NR was used for patterning and surface treatment in oxygen plasma.

11 Apr

Scientific Paper on TiN on Si hybrid-plasmonic-photonic waveguide from Virginia Commonwealth University

Samco 2021 Customer, Other Materials Etch, Samco Customer Publication, Si Etch, Silicon/Dielectrics Etch, TiN Etch

A Platform for CMOS Compatible Plasmonics: High Plasmonic Quality Titanium Nitride Thin Films on Si (001) with an MgO Interlayer

Kai Ding 1, Dhruv Fomra 1, Alexander V. Kvit 2, Hadis Morkoç 1, Nathaniel Kinsey 1, Ümit Özgür 1 and Vitaliy Avrutin 1
1 Department of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond, Virginia, 23284 USA
2 Materials Science Center, University of Wisconsin‐Madison, Madison, WI, 53706 USA
Advanced Photonics Research, 2000210 (2021)

A CMOS compatible hybrid-plasmonic-photonic waveguide was fabricated using TiN layer deposited by PEALD on Si (001) substrate with MgO interlayer. Samco ICP-RIE system RIE-101iPH was used for TiN/Au etching in chlorine chemistry and also Si etching in fluorine chemistry.

For more details of our ICP-RIE etch systems, please visit the product page below.
ICP-RIE Etch Systems