⌀8″
Cassette Loading
none
Dual Cassettes

High throughput system for production

The RIE-200C is a cassette type system for mass production, developed based on our experience with the CCP RIE system “RIE-10NR”, which has a longstanding stable record. This system is capable of high-precision etching and ashing of various silicon thin films such as Si, Poly-Si, SiO₂, SiN, etc. It achieves high throughput by employing a two-cassette, double-arm robot, fully automatic operation by PLC control, and high performance to store process parameters.

Key Features & Benefits

  • Atmospheric high speed transfer system

    This system is equipped with an atmospheric cassette chamber and an atmospheric transfer robot instead of the usual load lock chamber. It can handle automatic processing of up to ø8″ wafers and can be installed in two cassettes.

  • Fully automatic operation

    Operation is fully automated with a touch panel, and process management and data logging are possible with PLC control.

Applications

  • High-precision etching of various silicon thin films such as Si, Poly-Si, SiO₂, SiN, etc.
  • Photoresist ashing, stripping, and descuming
  • Removal of organic contaminants

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