⌀240 mm
Cassette Loading
none
Carrier Tray Transfer
Production system with dual cassettes
The UV-300HC is a high performance and cassette loading UV ozone cleaner for production. This industry-leading system has 2 atmospheric loading cassettes and can achieve ashing rates of 10-100 nm / min. It enables electrical damage-free surface preparation prior to the epitaxial growth and photolithography of compound semiconductors (such as InP, GaAs, GaN, and SiC). This system uses a unique combination of ultraviolet irradiation, high-concentration ozone, and controlled stage heating to gently, yet effectively, remove organic contaminants and defect sources from a variety of substrates, including silicon, glass, compound semiconductors, sapphire, ceramics, and more.
Key Features & Benefits
- Processing up to ø240 mm (ø3″ x 5, ø4″ x 3, ø8″ x 1)
- Ashing rates of 10 – 100 nm/min
- Heating stage accelerates the cleaning rates and realizes a broad process temperature range
- Gap adjustment between the stage and the quartz diffusion plate enables uniformity improvement over the substrate
- Compact, uses minimum cleanroom space
- Easy, operates at atmospheric pressure – no vacuum system required
- Soft, completely dry process will not cause electrical damage to substrates
- Built-in ozone catalyst unit for reducing ozone concentration in the exhaust to a safe level
- Built to UL standards
Applications
- Pre-epitaxy surface cleaning of compound semiconductors (GaN, GaAs, InP, and SiC)
- Pre-lithography surface treatment (HMDS anchoring for photoresist adhesion improvement)
- Photoresist ashing and descumming
- Surface oxidation (thin oxide layer formation)
- Removal of organic contaminants
- UV curing
