Scientific Paper on Sapphire Plasma Etching from National Tsing-Hua University, Taiwan

January 10, 2015 Samco 2015 Customer, Other Materials Etch, Samco Customer Publication, Sapphire Etch

Bulk vertical micromachining of single-crystal sapphire using inductively coupled plasma etching for x-ray resonant cavities

P-C Chen1, P-T Lin1, D G Mikolas1, Y-W Tsai2, Y-L Wang1, C-C Fu1 and S-L Chang2
1 Institute of Nano Engineering and Microsystems, National Tsing-Hua University, No. 101, Kuang-fu Rd, Sec. II, Hsinchu 300, Taiwan
2 Department of Physics, National Tsing-Hua University, No. 101, Kuang-fu Rd, Sec. II, Hsinchu 300, Taiwan
J. Micromech. Microeng. (2015) 25 015016

Samco ICP Etching System was used for the recipe optimization of sapphire plasma etching in x-ray resonant cavity fabrication.

Sapphire Periodic Table

For our process capabilities of sapphire plasma etching, please visit the page below.
Sapphire Dry Etching Process (ICP-RIE)

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