Scientific Paper on Microfluidics Fabrication from Princeton University Using SAMCO DRIE System

October 1, 2015 Samco 2015 Customer, Microfluidics, SAMCO Customer Publication, Si DRIE, Silicon/Dielectrics Etch

Microfluidic chemical processing with on-chip washing by deterministic lateral displacement arrays with separator walls

Yu Chen1,2, Joseph D’Silva1,2, Robert H. Austin1,3 and James C. Sturm1,2
1 Princeton Institute for Science and Technology of Materials (PRISM), Princeton, New Jersey 08544, USA
2 Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544, USA
3 Department of Physics, Princeton University, Princeton, New Jersey 08544, USA
BIOMICROFLUIDICS 9, 054105 (2015)

Samco Silicon DRIE System at Princeton University was used for microchannel fabrication. Silicon Periodic Table

For our process capabilities of deep silicon etching, please visit the pages below.
Si DRIE (Deep Reactive Ion Etching) for MEMS and TSV
Deep Silicon Trench/Via Hole Etching using Bosch Process

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