Innovation with the New Plasma Source HSTC-M™
Samco introduces the HSTC-M™ plasma source for uniform, stable ICP etching of SiC and GaN power devices up to 8-inch wafers across research and production systems.
RIKEN: Dr. Takuo Tanaka
Optical metamaterials research, including nanostructures for light manipulation and high-sensitivity molecular detection, using Samco’s RIE-400iP.
Samco Announces Sale of Advanced Etching Systems to III-V Lab in Europe
Samco announces the sale of two RIE-400iP ICP-RIE systems to France-based III-V Lab to support advanced III-V semiconductor and silicon integration research.