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      • Atomic Layer Etching (ALE) Systems
      • Inductively Coupled Plasma (ICP) Etching Systems
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      • UV Ozone Cleaning Systems
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      • Cathode PECVD
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      • Compound Semiconductor Etching
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Monthly Archives: September 2024

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Long-Term Process Stability of “PD-220 Series” Systems

Technical reportsBy MeganSeptember 14, 2024

Introduction to the Long-Term Process Stability of Samco Plasma CVD “PD-220 Series” Systems Samco Inc. Introduction Samco Inc. boasts a 45-year history of experience in developing plasma CVD process technology and supplying products, establishing itself as a leader in the industry. In recent years, production plasma CVD systems have been increasingly adopted in the fields…

ICFO: Dr. Johann Osmond

InterviewsBy MeganSeptember 12, 2024

Nanophotonics research, advanced applications, and the role of RIE-10NR in ICFO’s photonics projects.

Part 1 – Introduction to Si DRIE (Silicon Deep Reactive Ion Etching)

TutorialsBy MeganSeptember 6, 2024

Bosch Process Tutorial: Part 1. Intro to Si DRIE Silicon is most well-known as a semiconductor material, but because of its high mechanical strength and ease of processing, it is also commonly used in a wide variety of devices such as MEMS, optical components, micro-channel devices, and packaging. There are many methods for processing silicon,…

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