Category: TiO2 Etch

10 Nov

Scientific Paper on Polymer Waveguide Modulator Fabrication Using TiO2 Plasma Etching from Kyushu University Team

Samco 2016 Customer, Other Materials Etch, Photonic Devices, SAMCO Customer Publication, TiO2 Etch

An electro-optic polymer-cladded TiO2 waveguide modulator

Feng Qiu1 Hiroki Miura2, Andrew M. Spring1, Jianxun Hong1, Daisuke Maeda3, Masa-aki Ozawa3, Keisuke Odoi3 and Shiyoshi Yokoyama1,2
1 Institute for Materials Chemistry and Engineering, Kyushu University, 6-1 Kasuga-koen Kasuga-city, Fukuoka 816-8580, Japan
2 Department of Molecular and Material Sciences, Kyushu University, 6-1 Kasuga-koen Kasuga-city, Fukuoka 816-8580, Japan
3 Nissan Chemical Industries, Ltd., 2-10-1 Tuboi Nishi, Funabashi, Chiba 274-8507, Japan
Appl. Phys. Lett. (2016) 109, 173301

TiO2 Periodic Table

Waveguide modulator device using organic electro-optic (EO) materials was studied in this research. Samco ICP plasma etcher was used for slot structure formation for TiO2 plasma etching in fluorine chemistry during device fabrication.

12 Nov

Scientific Paper on TiO2 Plasma Etching for Photonic Bandgap Structure from Tokyo Institute of Technology Team

Samco 2015 Customer, Other Materials Etch, SAMCO Customer Publication, TiO2 Etch

Calculation and fabrication of two-dimensional complete photonic bandgap structures composed of rutile TiO2 single crystals in air/liquid

Sachiko Matsushita1, Akihiro Matsutani2, Yasushi Morii1, Daito Kobayashi1, Kunio Nishioka2, Dai Shoji2, Mina Sato2, Tetsu Tatsuma3, Takumi Sannomiya1, Toshihiro Isobe1, Akira Nakajima1
1 Department of Metallurgy & Ceramics Science, Graduate School of Science & Technology, Tokyo Institute of Technology, 2-12-1-S7-8, Ookayama, Meguro-ku, Tokyo, 152-8552, Japan
2 Technical Department, Semiconductor and MEMS Processing Center, Tokyo Institute of Technology, 4259-R2-3 Nagatsuta, Midori-ku, Yokohama, 226-8503, Japan
3 Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo, 153-8505, Japan
Journal of Materials Science (2016) Volume 51, Issue 2, pp 1066-1073

Titanium Dioxide (TiO2) photonic crystal structure was fabricated using Samco Reactive Ion Etch (RIE) system using fluorine chemistry. Two-dimensional photonic band gaps of the TiO2 structure were theoretically and experimentally studied.

Go to Nakajima & Matushita Lab, Tokyo Institute of Technology

12 Jul

Scientific Paper on Nb-TiO2 Dry Etching Process from Tokyo Institute of Technology

Samco 2014 Customer, Other Materials Etch, SAMCO Customer Publication, TiO2 Etch

Angled etching of (001) rutile Nb–TiO2 substrate using SF6-based capacitively coupled plasma reactive ion etching

Akihiro Matsutani1, Kunio Nishioka1, Mina Sato1, Dai Shoji1, Daito Kobayashi2, Toshihiro Isobe2, Akira Nakajima2, Tetsu Tatsuma3 and Sachiko Matsushita2
1 Semiconductor and MEMS Processing Center, Tokyo Institute of Technology, Yokohama 226-8503, Japan
2 Department of Metallurgy and Ceramics Science, Tokyo Institute of Technology, Meguro, Tokyo 152-8550, Japan
3 Institute of Industrial Science, The University of Tokyo, Meguro, Tokyo 153-8505, Japan
Jpn. J. Appl. Phys. (2014) 53 06JF02

Rutile Nb–TiO2 substrates were etched using Samco Reactive Ion Etch (RIE) System. Vertical sidewalls and a smooth surface were successfully achieved.

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