Category: Solar Cell
Design concept of a hybrid photo-voltaic/thermal conversion cell for mid-infrared light energy harvester
Yoshiaki Nishijima1, Ryosuke Komatsu1, Takuya Yamamura1, Armandas Balčytis2,3, Gediminas Seniutinas2,4, and Saulius Juodkazis2,5,
1 Department of Electrical and Computer Engineering, Graduate School of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
2 Nanotechnology Facility, Centre for Micro-Photonics, Swinburne University of Technology, John St., Hawthorn, Victoria 3122, Australia
3 Institute of Physics, Center for Physical Sciences and Technology, 231 Savanoriu̧ av., LT-02300 Vilnius, Lithuania
4 Paul Scherrer Institute, Villigen CH-5232, Switzerland
5 Melbourne Centre for Nanofabrication, ANFF, 151 Wellington Road, Clayton VIC 3168, Australia
Optical Materials Express 7, 10, pp. 3484-3493 (2017)
Typical silicon-based solar cells have limitation on conversion efficiencies especially at IR wavelengths. Utilization of IR spectra and thermal parts is critical to increase the total efficiency of the solar cells. In this research, a hybrid photovoltaic/thermoelectric conversion system was proposed to maximize conversion efficiencies. Samco ICP-RIE System, RIE-101iPH was used to form black silicon (b-Si) on a silicon substrate.
Min Wang1,2, Yulian Zhang1, Linfeng Lu1, Dongdong Li1 and Xufei Zhu3
1 Shanghai Advanced Research Institute, Chinese Academy of Sciences, 99 Haike Road, Zhangjiang Hi-Tech Park, Pudong, Shanghai 201210, People’s Republic of China
2 University of Chinese Academy of Sciences, Beijing 100039, People’s Republic of China
3 School of Chemical Engineering, Nanjing University of Science and Technology, Nanjing 210094, People’s Republic of China
Mater. Res. Express (2017) 4 055005
Crystalline silicon nano-hole array was fabricated using UV nanoimprint (UV-NIL) technology for potential silicon solar cell applications. Samco RIE ether, RIE-10NR was used in device fabrication for photoresist ashing and silicon plasma etching processes. Nano-hole array structures were successfully fabricated.
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RIE Plasma Etcher
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Scientific Paper on Silicon Solar Cells from Japan Science and Technology and Tokyo Institute of Technology
High-performance a-Si1–xOx:H/c-Si heterojunction solar cells realized by the a-Si:H/a-Si1–xOx:H stack buffer layer
He Zhang1, Kazuyoshi Nakada2, Shinsuke Miyajima2 and Makoto Konagai1,2
Phys. Status Solidi RRL (2015) 9: 225–229.
1 MEXT/FUTURE-PV Innovation Research, Japan Science and Technology (JST), Koriyama, Fukushima, Japan
2 Department of Physical Electronics, Tokyo Institute of Technology, Meguro-ku, Tokyo, Japan
Samco PECVD system was used for silicon thin film deposition in solar cell fabrication.