Scientific Paper on Film Properties of a-Si:H and SiO2 Plasma CVD Films by University of West Bohemia, Czech Republic
Investigation of the transition phases from amorphous silicon-based multilayers to silicon nanostructures by in situ X-ray diffraction
Solomon Agbo, Pavel Calta, Pavol Sutta, Veronika Vavrunkova, Marie Netrvalova and Lucie Prusakova
New Technologies Research Centre, University of West Bohemia, Pilsen, Czech Republic
physica status solidi (a) (2014) 211, 7, 1512–1518
Samco Plasma CVD System was used for deposition of multilayers comprising alternating layers of a-Si:H and SiO2.
For more details of our SiO2 Plasma CVD technologies, please visit the process data page below.
SiO2 Plasma CVD Process Data