Scientific Paper on Film Properties of a-Si:H and SiO2 Plasma CVD Films by University of West Bohemia, Czech Republic

June 25, 2014 Samco 2014 Customer, a-Si PECVD, SAMCO Customer Publication, Silicon/Dielectrics PECVD

Investigation of the transition phases from amorphous silicon-based multilayers to silicon nanostructures by in situ X-ray diffraction

Solomon Agbo, Pavel Calta, Pavol Sutta, Veronika Vavrunkova, Marie Netrvalova and Lucie Prusakova
New Technologies Research Centre, University of West Bohemia, Pilsen, Czech Republic
physica status solidi (a) (2014) 211, 7, 1512–1518

Samco Plasma CVD System was used for deposition of multilayers comprising alternating layers of a-Si:H and SiO2.

For more details of our SiO2 Plasma CVD technologies, please visit the process data page below.
SiO2 Plasma CVD Process Data

SiO2 Periodic Table

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