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  • Products
    • Deposition Systems
      • Atomic Layer Deposition (ALD)
      • Anode PECVD
      • Cathode PECVD
    • Etching Systems
      • Atomic Layer Etching (ALE)
      • Inductively Coupled Plasma (ICP) Etching
      • Si Deep Reactive Ion Etching (DRIE)
      • Reactive Ion Etching (RIE) – Plasma Etching
      • Xenon Difluoride (XeF2) Etching
    • Surface Treatment Systems
      • Aqua Plasma®
      • Plasma Cleaning
      • UV Ozone Cleaning
  • Processes
    • Deposition
      • Atomic Layer Deposition (ALD)
      • Anode PECVD
      • Cathode PECVD
    • Etching
      • Atomic Layer Etching (ALE)
      • Compound Semiconductor Etching
        • GaN Etching
        • GaAs Etching
        • InP Etching
      • Silicon Etching & DRIE
      • Metal/Dielectric Etching
      • Failure Analysis
    • Surface Treatment
      • Aqua Plasma®
      • Plasma Cleaning
      • UV Ozone Cleaning
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Monthly Archives: October 2025

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Samco Now 131 Technical Report: Atomic-Level Etch Control - Introduction to Atomic Layer Etching (ALE) Systems

Atomic Layer Etching Control – Intro to ALE Systems

Technical reportsBy MeganOctober 10, 2025

Introducing Samco’s Atomic Layer Etching (ALE) systems, detailing precise low-bias control and fast gas switching for uniform, low-damage etching processes.

Photo of Professor Akiyoshi Baba from Kyutech

Kyushu Institute of Technology: Professor Akiyoshi Baba

InterviewsBy MeganOctober 9, 2025

Prof. Akiyoshi Baba shares insights on CMOS/MEMS research and managing Japan’s leading open-access semiconductor facility at Kyutech’s Iizuka Campus.

University of Adelaide to Install RIE-400iP-ALE as Australia’s First ALE System

NewsBy MeganOctober 1, 2025

Samco’s RIE-400iP-ALE will become Australia’s first Atomic Layer Etching system, advancing III-V semiconductor and photonics research at the University of Adelaide.

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