Stable Device Isolation Processing for 6-Inch GaN-Based Power Devices
GaN device isolation etching using ICP-RIE and endpoint detection enables uniform processing and stable multi-wafer semiconductor production.
DTU Selects Samco Plasma Etching System for Quantum Photonics Research
The Technical University of Denmark selects Samco’s RIE-400iP plasma etching system for quantum photonics research, enabling precise III-V processing for single-photon device development.