Aqua Plasma Boost® and AQ-2000BT: Excellent for Reducing Large Sized Samples of Oxidized Copper
Samco developed Aqua Plasma Boost® to enhance oxidized copper reduction using reducing gas and water vapor.
Kyushu University (I²CNER): Dr. Shigenori Fujikawa
Aqua Plasma® used for surface
modification of CO2 separation
nanomembranes.
The University of Tokyo: Dr. Satoshi Iwamoto and Photonics Research
Topological, diamond, and quantum nanophotonics, redefining light control and driving next-generation photonic innovation.
Application of Aqua Plasma® for Microbumps
Samco’s Aqua Plasma® improves microbump fabrication by enhancing photoresist and Cu hydrophilization, preventing oxidation, and enabling better plating solution penetration for fine patterns.
New Approach for Trench Type SiC MOSFET
Introduction Compared to the mainstream semiconductor Si, the wide bandgap semiconductor 4H-SiC has excellent material qualities including higher electrical breakdown strength and higher thermal conductivity. Therefore, 4H-SiC has been studied in recent years as a new material to improve miniaturization and energy saving in power devices. Currently, it is being developed not only for device…