Innovation with the New Plasma Source HSTC-M™
Samco introduces the HSTC-M™ plasma source for uniform, stable ICP etching of SiC and GaN power devices up to 8-inch wafers across research and production systems.
RIKEN: Dr. Takuo Tanaka
Optical metamaterials research, including nanostructures for light manipulation and high-sensitivity molecular detection, using Samco’s RIE-400iP.
Samco Announces Sale of Advanced Etching Systems to III-V Lab in Europe
Samco announces the sale of two RIE-400iP ICP-RIE systems to France-based III-V Lab to support advanced III-V semiconductor and silicon integration research.
FORTUNE Magazine: Kyoto’s Semiconductor Success
Samco is featured in FORTUNE Businessweek on Kyoto’s semiconductor strength, highlighting Samco’s global growth, R&D expansion, and innovation rooted in Kyoto.
Toyohashi University of Technology: Dr. Hiroto Sekiguchi
Bio-implantable microLED devices using RIE-200NL and PD-220NL systems.
Introduction of the Three-Chamber CVD System “PD-2203LC”
Overview of three-chamber CVD system “PD-2203LC”, enabling stable SiN/SiO2 deposition with flexible frequency options for research and production.
RIE-10NR Achieves Sales Milestone of 500 Units
Samco’s RIE-10NR CCP-RIE system surpasses 500 units shipped, marking a major milestone for a widely adopted etching tool in global research and development.
Osaka Metropolitan University: Professor Masataka Higashiwaki, Ph.D.
Research on Ga₂O₃ devices using RIE-200NL and other systems.
Samco and Eastern Switzerland University of Applied Sciences (OST) Announce Collaboration for Research Advancements
Samco and OST launch a partnership to support European R&D, providing RIE-10NR and UV-2 systems for microtechnology and photonics research in Switzerland.
Samco Inc. to Construct Third R&D Facility as Demand Surges for Innovative Semiconductor Equipment
Samco announces plans to build a third R&D facility near its Kyoto headquarters, expanding cleanroom capacity to accelerate semiconductor equipment innovation.