Samco Strengthens Collaboration with IIT Delhi, Advancing Japan-India Technology and Talent Exchange
Samco strengthens collaboration with IIT Delhi to advance Japan–India technology exchange, energy research, and talent development.
Samco strengthens collaboration with IIT Delhi to advance Japan–India technology exchange, energy research, and talent development.
Samco’s single-wafer Aqua Plasma® system for wafer cleaning and descum processes, delivering improved ashing rates, uniformity, and throughput.
Cornell EMBA students visited Samco’s Kyoto headquarters to explore semiconductor innovation, leadership, and cross-cultural business insights.
MIT Professor Tomás Palacios visited Samco to discuss next-generation microelectronics, advanced materials, and potential research collaboration.
Samco introduces the PD-101TC PECVD system, enabling high-temperature thin film deposition up to 700°C for advanced semiconductor research.
Learn the fundamentals of Atomic Layer Deposition (ALD), a thin-film technique enabling atomic-scale thickness control, conformal coatings, and high-quality films.
Micro- and nanoscale device research, deposition and etching processes using RIE and PECVD for advanced structures.
Advanced ICP trench etching for SiC MOSFETs achieving over 700 nm/min etch rates, rounded trench bottoms, and high uniformity on 6-inch wafers.
Research on silicon spin qubits for quantum computing, using PD-2201LC, RIE-400iPC, and RIE-230LC.
Learn how UV-ozone cleaning works, its advantages over plasma cleaning, and applications in semiconductor surface preparation and materials research.