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  • Products
    • Deposition Systems
      • Atomic Layer Deposition (ALD)
      • Anode PECVD
      • Cathode PECVD
    • Etching Systems
      • Atomic Layer Etching (ALE)
      • Inductively Coupled Plasma (ICP) Etching
      • Si Deep Reactive Ion Etching (DRIE)
      • Reactive Ion Etching (RIE) – Plasma Etching
      • Xenon Difluoride (XeF2) Etching
    • Surface Treatment Systems
      • Aqua Plasma®
      • Plasma Cleaning
      • UV Ozone Cleaning
  • Processes
    • Deposition
      • Atomic Layer Deposition (ALD)
      • Anode PECVD
      • Cathode PECVD
    • Etching
      • Atomic Layer Etching (ALE)
      • Compound Semiconductor Etching
        • GaN Etching
        • GaAs Etching
        • InP Etching
      • Silicon Etching & DRIE
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      • Failure Analysis
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      • Aqua Plasma®
      • Plasma Cleaning
      • UV Ozone Cleaning
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Author Archives: Megan

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  2. Article author Megan

Hokkaido University: Professor Yasutaka Matsuo

InterviewsBy MeganJuly 12, 2023Leave a comment

Nano, micro-fabrication technology and materials development and thermal ALD for photochemistry.

Aqua Plasma Boost® and AQ-2000BT: Excellent for Reducing Large Sized Samples of Oxidized Copper

Technical reportsBy MeganApril 28, 2023

Samco developed Aqua Plasma Boost® to enhance oxidized copper reduction using reducing gas and water vapor.

Kyushu University (I²CNER): Dr. Shigenori Fujikawa

InterviewsBy MeganApril 12, 2023Leave a comment

Aqua Plasma® used for surface
modification of CO2 separation
nanomembranes.

Dr. Satoshi Iwamoto in clean wear in front of Samco system (University of Tokyo)

The University of Tokyo: Dr. Satoshi Iwamoto and Photonics Research

InterviewsBy MeganJanuary 11, 2023

Topological, diamond, and quantum nanophotonics, redefining light control and driving next-generation photonic innovation.

Application of Aqua Plasma® for Microbumps

Technical reportsBy MeganMarch 3, 2020

Samco’s Aqua Plasma® improves microbump fabrication by enhancing photoresist and Cu hydrophilization, preventing oxidation, and enabling better plating solution penetration for fine patterns.

Electric car on charging spot with solar panels and wind energy in front of landscape (Showing application of power devices using SiC Trench MOSFETs

New Approach for Trench Type SiC MOSFET

Technical reportsBy MeganMarch 7, 2019

A new trench-type SiC MOSFET fabrication approach combining ICP dry etching and ALD/PECVD gate insulators for improved breakdown and device performance.

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