RIE-10NR Achieves Sales Milestone of 500 Units
Samco’s RIE-10NR CCP-RIE system surpasses 500 units shipped, marking a major milestone for a widely adopted etching tool in global research and development.
Osaka Metropolitan University: Professor Masataka Higashiwaki, Ph.D.
Research on Ga₂O₃ devices using RIE-200NL and other systems.
Samco and Eastern Switzerland University of Applied Sciences (OST) Announce Collaboration for Research Advancements
Samco and OST launch a partnership to support European R&D, providing RIE-10NR and UV-2 systems for microtechnology and photonics research in Switzerland.
Samco Inc. to Construct Third R&D Facility as Demand Surges for Innovative Semiconductor Equipment
Samco announces plans to build a third R&D facility near its Kyoto headquarters, expanding cleanroom capacity to accelerate semiconductor equipment innovation.
Hokkaido University: Professor Yasutaka Matsuo
Nano, micro-fabrication technology and materials development and thermal ALD for photochemistry.
Aqua Plasma Boost® and AQ-2000BT: Excellent for Reducing Large Sized Samples of Oxidized Copper
Samco developed Aqua Plasma Boost® to enhance oxidized copper reduction using reducing gas and water vapor.
Kyushu University (I²CNER): Dr. Shigenori Fujikawa
Aqua Plasma® used for surface
modification of CO2 separation
nanomembranes.
The University of Tokyo: Dr. Satoshi Iwamoto and Photonics Research
Topological, diamond, and quantum nanophotonics, redefining light control and driving next-generation photonic innovation.
Application of Aqua Plasma® for Microbumps
Samco’s Aqua Plasma® improves microbump fabrication by enhancing photoresist and Cu hydrophilization, preventing oxidation, and enabling better plating solution penetration for fine patterns.
New Approach for Trench Type SiC MOSFET
A new trench-type SiC MOSFET fabrication approach combining ICP dry etching and ALD/PECVD gate insulators for improved breakdown and device performance.